View source for New lithography technique allows nanoscale resolution with visible light

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http://www.nanowerk.com/news/newsid=19977.php

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niversity of Maryland researchers have made a breakthrough in the use of visible light for making tiny integrated circuits. Though their advance is probably at least a decade from commercial use, they say it could one day make it possible for companies like Intel to continue their decades long tread of making ever smaller, faster, and cheaper computer chips.
For some 50 years, the integrated circuits, or chips, that are at the heart of computers, smart phones, and other high-tech devices have been created through a technique known as photolithography, in which each computer chip is built up in layers.
In photolithography, each layer of a conductive material (metal, treated silicon, etc,) is deposited on a chip and coated with a chemical that hardens when exposed to light. Light shining through a kind of stencil know as a mask projects a detailed pattern onto the photoresist, which hardens where it's exposed. Then, the unhardened areas of photoresist and underlying metal are etched away
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