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Direct writing of sub-5 nm metallic nanostructures
(Nanowerk News) A group of Beckman Institute researchers have discovered a practical method for direct writing of metal lines less than five nanometers (5 nm) wide, a big step in creating contacts to and interconnects between nanoscale device structures like carbon nanotubes and graphene that have potential uses in electronics applications.
The research was led by Beckman faculty members Joe Lyding, Gregory Girolami and Angus Rockett, with Lyding student Wei Ye as lead author. Their paper reporting the research is titled Direct Writing of Sub-5 nm Hafnium Diboride Metallic Nanostructures and appeared in the journal ACS Nano ("Direct Writing of Sub-5 nm Hafnium Diboride Metallic Nanostructures").
Sub-5 nm metallic hafnium diboride (HfB2) nanostructures
Sub-5 nm metallic hafnium diboride (HfB2) nanostructures were directly written onto Si(100)-2 × 1:H surfaces using ultrahigh vacuum scanning tunneling microscope (UHV-STM) electron beam i
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